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Investigation of Q degradation in low-loss Si3N4 from het... | ResearchHub
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Investigation of Q degradation in low-loss Si3N4 from heterogeneous laser integration
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Authors
Joel Guo
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Joel Guo
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Chao Xiang
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John Bowers
Published
April 15, 2024
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Topics
Computer Science
Materials Science
Physics
Optics
Materials Chemistry
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DOI
10.1109/siphotonics60897.2024.10543516
